Data Mining Analysis of Turn around Time Variation in a Semiconductor Manufacturing Line

Il-Gyo Chong, Chenbo Zhu, Yanfeng Wu

2015

Abstract

Variation reduction of Turn Around Time (TAT) in a manufacturing line is one of the important issues for line optimization. In a manufacturing line with many sequential process steps such as semiconductor fabrication, it is not easy to find the root causes of the TAT variation because (1) there might be a big time gap (more than 30 days) between cause and effect, and (2) there are so many machines (or tools) related with a process. The purpose of this paper is to propose a data mining based method to identify the root cause of TAT variation. We also aim to validate the performance of the proposed method through a simulation study.

References

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Paper Citation


in Harvard Style

Chong I., Zhu C. and Wu Y. (2015). Data Mining Analysis of Turn around Time Variation in a Semiconductor Manufacturing Line . In Proceedings of the International Conference on Operations Research and Enterprise Systems - Volume 1: ICORES, ISBN 978-989-758-075-8, pages 185-189. DOI: 10.5220/0005253301850189


in Bibtex Style

@conference{icores15,
author={Il-Gyo Chong and Chenbo Zhu and Yanfeng Wu},
title={Data Mining Analysis of Turn around Time Variation in a Semiconductor Manufacturing Line},
booktitle={Proceedings of the International Conference on Operations Research and Enterprise Systems - Volume 1: ICORES,},
year={2015},
pages={185-189},
publisher={SciTePress},
organization={INSTICC},
doi={10.5220/0005253301850189},
isbn={978-989-758-075-8},
}


in EndNote Style

TY - CONF
JO - Proceedings of the International Conference on Operations Research and Enterprise Systems - Volume 1: ICORES,
TI - Data Mining Analysis of Turn around Time Variation in a Semiconductor Manufacturing Line
SN - 978-989-758-075-8
AU - Chong I.
AU - Zhu C.
AU - Wu Y.
PY - 2015
SP - 185
EP - 189
DO - 10.5220/0005253301850189