Authors:
Jay Arre Toque
;
Yuji Sakatoku
;
Julia Anders
;
Yusuke Murayama
and
Ari Ide-Ektessabi
Affiliation:
Graudate School of Engineering, Kyoto Univeristy, Japan
Keyword(s):
Multispectral imaging, Analytical imaging, Spectral reflectance, Image stitching.
Related
Ontology
Subjects/Areas/Topics:
Applications and Services
;
Computer Vision, Visualization and Computer Graphics
;
Image and Video Coding and Compression
;
Image Enhancement and Restoration
;
Image Formation and Preprocessing
;
Physics Imaging (Radar Imaging, Photoelectronics, Molecular Imaging)
Abstract:
Illumination condition is one of the most important factors in imaging. Due to the relatively complex interaction occurring when an incident light is irradiated on the surface of an object, it has been a topic of researches and studies for quite a while now. In this study, its influence on the reconstruction of spectral reflectance and image stitching was explored. A traditional Japanese painting was used as the target. Spectral reflectance was estimated using pseudoinverse model from multispectral images captured with seven different filters with spectral features covering 380-850 nm wavelengths. It was observed that the accuracy of the estimation is dependent on the quality of multispectral images, which are greatly influenced by lighting conditions. High specular reflection on the target yielded large amount of estimation errors. In addition, the spectral feature of the filters was shown to be important. Data from at least four filters are necessary to get a satisfactory reconstru
ction. On the other hand, it was observed that in addition to specular reflection, the distribution of light highly affects image stitching. Image stitching is important especially when acquiring images of large objects. It was shown that multispectral images could be used for the analytical imaging of artworks.
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