Filtering Fringe Patterns
with the Extended Non Local Means Algorithm
Maciej Wielgus and Krzysztof Patorski
Institute of Micromechanics and Photonics, ul. Św. A. Boboli 8, 02-525 Warsaw, Poland
Keywords: Fringe Pattern Processing, Image Filtration, Non Local Means.
Abstract: The quality of interferometric measurements substantially benefits from the digital noise filtration.
Recently, robust non local filtration algorithms were introduced to optical metrology, the non local means
algorithm in particular. These methods allow to take advantage from the information redundancy spread in
the whole image domain for processing each pixel, constituting a powerful image denoising tool. We
evaluate how the denoising performance quality of the non local means algorithm can be further increased
by the introduction of geometrical transformations of the compared patches.
1 INTRODUCTION
Uncertainty is an intrinsic feature of every
measurement, appearing as noise in the measuring
system output. For fundamental reasons it is
impossible to fully remove its influence by hardware
setup modification. Instead of increasing the
hardware requirements most (if not all) systems for
interferometric measurements introduce some digital
noise filtration, applied to the registered pattern
before further processing. In many cases this is
a simple down-pass filtration by averaging with
binary or Gaussian mask. Median filter is a popular
choice as well. Dozens of more sophisticated
methods were proposed throughout the years.
One of the attractive novel developments in
image processing is the notion of the non local
filtration such as the non local means algorithm –
NLM (Buades et al., 2005). This group of methods
was recognized in the fringe pattern analysis just
recently. In (Wielgus and Patorski, 2012) basic
NLM algorithm was tested against several popular
filtration methods for interferometric pattern
filtration, while in (Fu and Zhang, 2012) modified
technique was proposed. The power of non local
methods lays in their ability of utilizing redundancy
in the whole image domain rather than in limited
neighbourhood of the considered pixel. Typically in
non local processing we compare patches (small
subimages containing the central pixel and its
neighbourhood) and average the intensities of their
central pixels based on established measure of patch
similarity. Unlike local averaging, the non local
method enables to avoid oversmoothing the image
and blurring its delicate features.
Robustness of non-local filtration for
photographic images, as shown in (Buades et al.,
2012), could be found as a surprising issue, as these
images do not represent any visible similarity of
distant patches. However, as noted in (Wielgus and
Patorski, 2012), situation is very different with
fringe patterns, which are quasiperiodic in nature
and therefore display similarity even between
significantly distant patches. To illustrate and
quantitatively evaluate this effect we calculate the
correlation of the fringe pattern presented in Figure
1 (a) with its chosen patch, located in the centre of
the image. This is a fragment of an experimentally
obtained interferogram of a silicone micromembrane
(Salbut et al., 2003). In Figure 1 (b) we show the
map of cross-correlation between the image and the
selected patch (brighter color = more similarity).
Note that it is a nonmonotonic function of distance
from the considered patch and that correlation
reaches high values even quite far away from the
chosen patch. This explains why non local methods
are supposed to fit particularly well for the fringe
pattern filtration. For the sake of clarity, only pixels
with normalized correlation larger than 0.3 are
shown.
In this paper we intend to exploit another
property of fringe patterns to further increase the
redundancy from which non local methods benefit,
52
Wielgus M. and Patorski K..
Filtering Fringe Patterns with the Extended Non Local Means Algorithm.
DOI: 10.5220/0004339500520055
In Proceedings of the International Conference on Photonics, Optics and Laser Technology (PHOTOPTICS-2013), pages 52-55
ISBN: 978-989-8565-44-0
Copyright
c
2013 SCITEPRESS (Science and Technology Publications, Lda.)