Study on Pulsed Voltage Regulation Technology of Precision Plating Power Supply

Feng Wang, Yongbin Zhang, Guangmin Liu, Qing Wang, Rangjie Wu

2018

Abstract

For the existing precision plating pulse power, in order to achieve the precise control of the voltage, the output voltage can be adjusted from 0 to 7V by changing the duty cycle of the MOSFET. In the system, Altera's Cy-cloneIV E-series chips are used as the master chip to design the PWM signal generation module, AD9215 current acquisition module and serial communication module. Verilog hardware language is used to write the program and Modelsim software is used for PWM simulation. The resulting pulse waveform and AD9215 data collected by the observed signaltap, voltage and current data at different duty cycle are recorded by a high-precision multimeter. Through the analysis of experimental results, the feasibility and correctness of pulse voltage regulation are verified.

Paper Citation

in Harvard Style

Wang F., Zhang Y., Liu G., Wang Q. and Wu R. (2018). Study on Pulsed Voltage Regulation Technology of Precision Plating Power Supply.In 3rd International Conference on Electromechanical Control Technology and Transportation - Volume 1: ICECTT, ISBN 978-989-758-312-4, pages 503-509. DOI: 10.5220/0006973305030509

in Bibtex Style

@conference{icectt18,
author={Feng Wang and Yongbin Zhang and Guangmin Liu and Qing Wang and Rangjie Wu},
title={Study on Pulsed Voltage Regulation Technology of Precision Plating Power Supply},
booktitle={3rd International Conference on Electromechanical Control Technology and Transportation - Volume 1: ICECTT,},
year={2018},
pages={503-509},
publisher={SciTePress},
organization={INSTICC},
doi={10.5220/0006973305030509},
isbn={978-989-758-312-4},
}

in EndNote Style

TY - CONF

JO - 3rd International Conference on Electromechanical Control Technology and Transportation - Volume 1: ICECTT,
TI - Study on Pulsed Voltage Regulation Technology of Precision Plating Power Supply
SN - 978-989-758-312-4
AU - Wang F.
AU - Zhang Y.
AU - Liu G.
AU - Wang Q.
AU - Wu R.
PY - 2018
SP - 503
EP - 509
DO - 10.5220/0006973305030509