them, the accuracy is relatively low when an edge-
ring pattern is mixed.
Figure 9: The histogram for the difference of probabilities.
Table 2: Classification accuracy for the mixed-type data.
Pattern Type Accuracy
Center + Edge-Loc 59%
Scratch + Edge-Loc 41.6%
Center + Edge-Ring 69%
Scratch + Edge-Ring 64.4%
Center + Scratch 40%
5 CONCLUSIONS
This paper proposed the probabilistic method for
classifying defect patterns on wafer bin maps. We
construct the pre-trained model with the convolutional
autoencoder and convolutional neural networks. And,
we determine whether the patterns are mixed on wafer
maps, by calculating between the threshold and the
difference of probabilities. Experiments with WM-
811K data verifies the performance of the model. The
classification performance for the single-type pattern
of the model is excellent, but the performance for the
mixed-type pattern is relatively low. It is assumed that
the patterns of training data are not clearly
distinguished and that the threshold value is set to a
very high value due to the imbalance in the number of
single-type data and mixed-type data. So, it is
necessary to supplement such parts later. And, we
assume the only two patterns can be mixed, so the
study for more mixed-type patterns has to be conducted
to apply for the actual data.
ACKNOWLEDGEMENTS
This work was supported by the National Research
Foundation of Korea (NRF) grant funded by the Korea
government (MSIT) (NRF-2019R1A2C2005949).
This work was also supported by the BK21 Plus (Big
Data in Manufacturing and Logistics Systems, Korea
University) and by the Samsung Electronics Co., Ltd.
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