Analysis of Optimal Polarization State Sampling Frequency Applied to Photoelastic Analyzer

Chih-Chung Yang, Chih-Ning Hsu, Yi-Yung Chen, Yu-Hsuan Lin, Hsin-Yi Tsai, Kuo-Cheng Huang, Chun-Han Chou

2022

Abstract

In the paper, we proposed a low-cost photoelastic analysis system and used this system to measure the stress distribution of the doublet lens. The doublet lens was measured by four types of sampling frequency. The sampling frequency was 45 degrees, 22.5degrees, 11.25degrees and 5degrees. The different sampling frequency data was used to build a chart which was the relationship between measurement error and sampling frequency. The chart could help who used the method to choose a suitable sampling frequency and establish the most efficient process of stress measurement. In the future, we hope to improve the photoelastic analysis system to be fully automatic and apply it in the factory production line.

Paper Citation

in Harvard Style

Yang C., Hsu C., Chen Y., Lin Y., Tsai H., Huang K. and Chou C. (2022). Analysis of Optimal Polarization State Sampling Frequency Applied to Photoelastic Analyzer. In Proceedings of the 10th International Conference on Photonics, Optics and Laser Technology - Volume 1: PHOTOPTICS, ISBN 978-989-758-554-8, pages 106-110. DOI: 10.5220/0010799900003121

in Bibtex Style

@conference{photoptics22,
author={Chih-Chung Yang and Chih-Ning Hsu and Yi-Yung Chen and Yu-Hsuan Lin and Hsin-Yi Tsai and Kuo-Cheng Huang and Chun-Han Chou},
title={Analysis of Optimal Polarization State Sampling Frequency Applied to Photoelastic Analyzer},
booktitle={Proceedings of the 10th International Conference on Photonics, Optics and Laser Technology - Volume 1: PHOTOPTICS,},
year={2022},
pages={106-110},
publisher={SciTePress},
organization={INSTICC},
doi={10.5220/0010799900003121},
isbn={978-989-758-554-8},
}

in EndNote Style

TY - CONF

JO - Proceedings of the 10th International Conference on Photonics, Optics and Laser Technology - Volume 1: PHOTOPTICS,
TI - Analysis of Optimal Polarization State Sampling Frequency Applied to Photoelastic Analyzer
SN - 978-989-758-554-8
AU - Yang C.
AU - Hsu C.
AU - Chen Y.
AU - Lin Y.
AU - Tsai H.
AU - Huang K.
AU - Chou C.
PY - 2022
SP - 106
EP - 110
DO - 10.5220/0010799900003121