The control limits UCL/LCL enclose the out-of-
control points and UCLmax/LCLmin delimit the
quality control area, concerning the primary variables
whose limits are determined by the secondary ones.
Sample 14 can be considered an out-of-quality point
and Table 1 displays the values of the secondary
variables which lead to this nonconformity. In other
words, the out-of-control points need a correct setting
of the secondary variables, but the out-of-quality
points need an investigation of the root causes that
lead to this output.
6 CONCLUSIONS
In many applications concerning quality control in
Industry 4.0 there are sensors that measure the output
quality variables and those that measure the
secondary variables affecting the output quality. A
quality control analysis should take this particularity
into account.
Due to correlation between measured variables in
the industrial process Multivariate analysis is of
paramount importance because individual variable
control can lead to erroneous conclusions.
Multivariate analysis based on the T
2
Hotelling is
a one-dimensional control chart representation
pointing out the out-of-control samples but does not
display how the secondary variables affects the
primary ones, considered the main quality variables.
Based on the Chi-squared distribution, a 2
nd
degree equation is derived highlighting the main
quality variable and its dependence on the secondary
ones. This approach allows the identification of out-
of-control points that affects quality and require some
adjustment of the secondary variables and the out-of-
quality points, which need an investigation of the root
causes that lead to this undesirable output.
For further work, we planned to include data
assimilation into the statistical modelling and
consider predictive uncertainty quantification in this
approach, with the purpose of evaluating to what
extension this analytical detailing will contribute to
support more assertive decisions. Such an evaluation
might be feasible, as long as we have a significant
increase in the amount of monitored data.
ACKNOWLEDGEMENTS
The authors would like to thank the Brazilian
Ministry of Science, Technology and Innovations for
the financial support part of this project through the
PADIS (Program of Support for the Technological
Development of the Semiconductor and Displays
Industry).
REFERENCES
Chien, C.-F., Chen, C.-C. (2021) Adaptative parametric
yield enhancement via collinear multivariate analytics
for semiconductor intelligent manufacturing. Applied
Soft Computing, 108.
https://doi.org/10.1016/j.asoc.2021.107385
Foild, H., and Felderer, M. (2016) Research Challenges of
Industry 4.0 for Quality Management. International
Conference on Enterprise Resource Planning Systems,
In: Felderer M., Piazolo F., Ortner W., Brehm L., Hof
HJ. (eds) Innovations in Enterprise Information
Systems Management and Engineering. ERP Future
2015. Lecture Notes in Business Information
Processing, vol 245. Springer, Cham.
https://doi.org/10.1007/978-3-319-32799-0_10
Godina R., Matias J.C.O. (2019) Quality Control in the
Context of Industry 4.0. In: Reis J., Pinelas S., Melão
N. (eds) Industrial Engineering and Operations
Management II. IJCIEOM 2018. Springer Proceedings
in Mathematics & Statistics, vol 281. Springer, Cham.
https://doi.org/10.1007/978-3-030-14973-4_17
Lee, S.M., Lee, D. & Kim, Y.S. (2019) The quality
management ecosystem for predictive maintenance in
the Industry 4.0 era. Int J Qual Innov 5, 4.
https://doi.org/10.1186/s40887-019-0029-5
Ma, M.-D, Wong, D.S.-H., Jang, S.-S., Tseng, S.-T. (2010)
Fault detection based on statistical multivariate analysis
and microarray visualization. IEEE Transactions on
Industrial Informatics, 6 (1), 18-24. Doi:
10.1109/TII.2009.2030793
Mahmud T., Sikder J., Chakma R.J., Fardoush J. (2021)
Fabric Defect Detection System. In: Vasant P., Zelinka
I., Weber GW. (eds) Intelligent Computing and
Optimization. ICO 2020. Advances in Intelligent
Systems and Computing, 1324. Springer, Cham.
https://doi.org/10.1007/978-3-030-68154-8_68
Mason, R. L.; Young, J. C. (2001) Multivariate Statistical
Process Control with Industrial Application.
Philadelphia: Society for Industrial and Applied
Mathematics.
May, G. S.; Spanos, C. J. (2006). Fundamentals of
semiconductor manufacturing and process control.
New Jersey: Wiley-Interscience.
Montgomery, D. (2013) Introduction to statistical quality
control. New York: John Wiley & Sons.
Mottonen, M., Belt, P., Harkonen, J., Haapasalo, H., Kess,
P. (2008) Manufacturing Process Capa-bility and
Specification Limit. The Open Industrial and
Manufacturing Engineering Journal, 1, 29-36.
Moyne, J., Iskandar, J. (2017) Big data analytics for smart
manufacturing: Case studies in semicon-ductor
manufacturing. Processes 2017, 5 (39).
Doi:10.3390/pr5030039