2  EXPERIMENTAL SETUP 
2.1  Process 
The used system consists of the pulsed fluorine laser 
LPF 220i of Coherent Lasersystems GmbH & Co. KG 
and the micro machining station EX-157. A detailed 
description  of  the  station  is  given  in  our  previous 
work (Buettner, Pfeifer, & Weissmantel, 2019), as the 
system is identical. Due to its beam characteristics the 
fluorine  laser  is  not  suited  for  the  direct-writing 
technique. Therefore, a mask projection technique is 
applied.  To  get  the  laser  pulse  fluence  H  evenly 
distributed  over  the  mask  area  the  laser  beam  is 
homogenized. If the threshold laser pulse fluence of 
the  material  to  be  structured  is  exceeded  the 
homogenization results in a uniform ablation depth. 
Both  the  laser  pulse  duration  and  the  used  laser 
wavelength  influence  the  threshold  laser  pulse 
fluence. The fluorine laser emits photons with a pulse 
duration of 25 ns and a wavelength of 157 nm, which 
corresponds to a photon energy of 7.9 eV. The photon 
energy is of  particular interest for  the  machining of 
wide  band gap materials, as the difference between 
photon energy and energy band gap has a direct effect 
on the processing quality. Higher photon energy, in 
relation to the band gap energy of the material to be 
structured,  results  in  a  better  surface  quality  of  the 
treated  material,  due  to  the  better  absorption 
conditions.  On the other hand, the energy band gap 
determines  which  optical  material  can  be  used  as 
mask  material  for  the  corresponding  wavelength of 
the laser. 
As  mentioned  above,  we  targeted  to  realize  a 
whole area treatment, which requires a combination 
of  several  masks.  More  precisely,  the  goal  was  to 
create  a  ring-shaped  ablation  area  with  a  variable 
inner and a constant outer radius. The inner radius of 
the  ablation  area  is  controlled  by  a  set  of  special 
circular  masks.  The  fabrication  of  the  masks  is 
described in the following subsection. 
2.2  Mask Generation 
As mentioned, the masks must be transparent for the 
wavelength of the laser. We choose calcium fluoride 
as  mask  substrate  material,  because  its  band  gap 
energy of 12.2 eV is higher than the photon energy. 
Therefore,  the  material  is  transparent  for  the  used 
laser  wavelength.  The  50  mask  substrates  have  a 
diameter  of  5  mm  and  a  thickness  of  0.5  mm.  The 
latter is very low, so that hardly any losses occur. To 
obtain an inner boundary of the ring-shaped ablation 
area, it is necessary to generate an opaque area on the 
mask  substrate.  We  used  a  pulsed  laser  deposited 
tantalum coating for this purpose. The main challenge 
in generating these opaque areas is to position them 
very precisely on the substrate. For the generation of 
micro-lenses,  these  areas  are  circles  with  different 
radii and these circles must each be concentric to the 
substrate.  To  solve  this  problem  of  precise 
positioning, a mask holder for the coating process was 
developed. 
The holder consists of three metal plates, the back 
plate, the sample plate, and  the front plate with the 
sample  plate  being  pinched  between  the  other  two 
plates. The sample plate is a 0.5 mm thick metal plate 
with  56  holes  of  5  mm  diameter  each  so  that  the 
calcium fluoride substrates fit ideally into these holes. 
Other  than  the  back  plate,  the  front  plate  also  got  
56 holes of 4 mm diameter to expose one face of the 
substrates for coating. To change the area to be 
coated,  an  additional  thin  tantalum  foil  is  placed 
between the sample  and the front plate. In  this foil, 
holes with different diameters were cut using an ultra-
short pulse laser. In the whole assembly the sample 
plate,  the  tantalum  foil  and  the  front  plate  were 
aligned and fixed on the back plate. 
All three plates have adjusting holes for a precise 
positioning  using  dowel  pins.  The  adjusting  holes 
ensure that all coating areas are concentric regarding 
the boundary of each substrate. Following, the pulsed 
laser  deposition  coating  process  is  applied  to  the 
assembly.  In  Figure  1  the  coated  calcium  fluoride 
substrates  are  shown.  Due  to  the  coating  mask 
(tantalum  foil)  geometries,  every  area  has  an 
individual inner radius generating ablation areas with 
a radius starting from 1 μm up to 50 μm in 1 μm steps 
as there are 50 different masks.
 
 
Figure 1: Coated calcium fluoride substrates on the sample 
plate after the pulsed laser deposition coating process, with 
the front plate and the coating mask removed.