Fabrication of CuO Nanoflakes at Gas-liquid Interface Via Chemical Bath Deposition with High Photocatalytic Activity

Xi Lin, Fengqiang Sun

2018

Abstract

Fabricating materials at gas-liquid interface is a kind of novel method and has aroused a great attention. Herein, we introduce a new chemical bath deposition method to fabricate CuO nanoflakes directly at the gas-liquid interface of a solution of CuSO4 and NH3·H2O. The structure and morphology are characterized by X-ray diffraction and scanning electron microscopy. The as-prepared CuO nanoflakes exhibited excellent visible light photocatalytic activity in degradation of RhB in the presence of a little amount of H2O2 under tungsten halogen lamp. The method is easily-manipulated, low-cost, environment friendly and promising for the fabrication of micro/nano-structured semiconductor functional materials including the photocatalyst.

Paper Citation

in Harvard Style

Lin X. and Sun F. (2018). Fabrication of CuO Nanoflakes at Gas-liquid Interface Via Chemical Bath Deposition with High Photocatalytic Activity.In The Second International Conference on Materials Chemistry and Environmental Protection - MEEP, ISBN 978-989-758-360-5, pages 208-211. DOI: 10.5220/0008187702080211

in Bibtex Style

@conference{meep18,
author={Xi Lin and Fengqiang Sun},
title={Fabrication of CuO Nanoflakes at Gas-liquid Interface Via Chemical Bath Deposition with High Photocatalytic Activity},
booktitle={The Second International Conference on Materials Chemistry and Environmental Protection - MEEP,},
year={2018},
pages={208-211},
publisher={SciTePress},
organization={INSTICC},
doi={10.5220/0008187702080211},
isbn={978-989-758-360-5},
}

in EndNote Style

TY - CONF

JO - The Second International Conference on Materials Chemistry and Environmental Protection - MEEP,
TI - Fabrication of CuO Nanoflakes at Gas-liquid Interface Via Chemical Bath Deposition with High Photocatalytic Activity
SN - 978-989-758-360-5
AU - Lin X.
AU - Sun F.
PY - 2018
SP - 208
EP - 211
DO - 10.5220/0008187702080211